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Conductor IR drop · I²R loss · electromigration

Voltage Drop Console

Every power conductor has resistance — resistivity × length ÷ cross-section — that drops voltage, wastes power as I²R heat, and, if the current density is too high, fails by electromigration. Size any trace, busbar or wire and check both the drop budget and the reliability limit.

01 · Quick estimate

Current, material & conductor geometry → voltage drop.

Voltage drop
49
mV · 0.4%
Resistance, I²R loss & electromigration ↓
02 · Deep analysis

Conductor console

Conductor cross-section
5000 × 70 µmcross-section · current density 0% of EM limit
Resistance
2.43 mΩ
Voltage drop
49 mV
I²R loss
971 mW
Current density
0.01
MA/cm²
Electromigration · 0% of Copper limit

Current density 0.01 MA/cm² is within Copper's ~2 MA/cm² limit — 100% headroom.

Read-out · 0.4% of 12V supply

The 50mm copper conductor (5000×70µm) has 2.43 mΩ resistance, dropping 49mV at 20A and dissipating 971mW as I²R heat.

Negligible against the supply. Copper has the lowest resistivity and highest EM tolerance of the common metals.

Roll this into the network-level budget in the Power Delivery Network console.

Why it matters

Why a conductor has two failure modes

Resistance is geometry times material

A conductor's resistance is resistivity times length over cross-sectional area. Long, thin, narrow traces resist; short, fat, copper ones don't. Every power path is a balance of these four.

Voltage drop is wasted budget and wasted power

Drop across a conductor both robs the load of voltage and dissipates power as heat (I²R). At high current even a low-resistance path can lose watts and millivolts that matter.

Electromigration limits current density, not current

Push too many amps through too small a cross-section and the electron wind physically moves metal atoms, eventually opening the wire. The limit is current per area (MA/cm²), which is why on-chip wires must widen as they carry more.

Copper beats aluminium — which is why chips switched

Copper's lower resistivity and higher electromigration tolerance are why the industry moved interconnect from aluminium to copper. The material choice directly sets both the IR drop and the current a wire can survive.

Field notes

Two budgets every wire must meet

A power conductor — whether a millimetre-wide PCB trace, a package busbar or a sub-micron on-chip wire — has to satisfy two independent constraints, and getting one right while missing the other is a classic failure. The first is electrical: the resistance, set by resistivity times length over cross-sectional area, drops voltage the load needed and burns power as I²R heat. The second is reliability: the current density, current per unit area, must stay below the metal's electromigration limit or the wire physically degrades and eventually fails.

These two constraints push on different dimensions. Voltage drop cares about total resistance, so it's helped by short, wide, thick, copper conductors. Electromigration cares only about current per area, so it's helped by more cross-section regardless of length. A short thin wire might pass the voltage-drop budget easily yet exceed the electromigration limit; a long fat one might be electromigration-safe but drop too much voltage. A sound design checks both, which is why this console reports the drop, the I²R loss and the current density against the limit together.

Material is the other lever, and it's why the industry made a historic switch. Copper has both lower resistivity than aluminium — less drop for the same geometry — and higher electromigration tolerance — more current per area before failure. As wires scaled thinner and currents rose, aluminium ran out of headroom on both counts, and copper interconnect (with diffusion barriers) took over. Selecting the material here shows both effects at once.

This tool analyzes one conductor in detail. The full power path is a network of many conductors plus planes, vias and decoupling, characterized by an overall target impedance — size and screen individual conductors here, then assemble the system view in the Power Delivery Network console, and remember the I²R loss feeds the thermal budget.

Voltage Drop FAQs

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Trusted by Power-Integrity & Interconnect Teams

4.8
Based on 2,900 reviews

Reporting voltage drop and current density together is exactly right — most calculators give one and miss the other. The electromigration check against a per-material limit is what I screen on-chip power straps with. Copper vs aluminium side by side makes the historical switch obvious.

D
Dr. Soo-jin Han
Interconnect reliability
June 8, 2026

Geometry in, resistance and IR drop out, with the I²R loss for the thermal budget — that's my whole busbar workflow. The percentage-of-supply framing keeps me honest about a 50mV drop meaning nothing on 48V and everything on 0.8V. Pairs perfectly with the PDN tool.

P
Pieter Janssen
PCB power integrity
April 29, 2026

Clean resistance-from-geometry with realistic PCB/package/on-chip presets. The EM headroom percentage is the reliability number I report. Would love temperature-corrected resistivity, but as a first-order sizing and screening tool it's excellent.

L
Lucia Romano
Package power design
March 9, 2026

I size power traces off this daily — width and thickness against both the IR-drop budget and the EM limit. The conductor cross-section visualization makes the geometry tangible. Fast, accurate, and the material choices cover what I actually use.

T
Tom Becker
Hardware electrical engineer
December 30, 2025

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R = resistivity × length ÷ (width × thickness) · drop = I × R · current density = I ÷ cross-section vs EM limit · Last reviewed: 2026-06