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Capital intensity · EUV lithography · equipment breakdown

Semiconductor CapEx Console

Estimate the capital cost of a fab from its target capacity and node. This console applies node-specific capital intensity ($ per wafer-per-month) and breaks the total into the equipment categories that consume it — lithography (EUV-dominated), etch, deposition, metrology, process tools and the cleanroom — live.

01 · Quick estimate

Capacity × node capital intensity → total build cost.

Total capex
$16B
$400K/wspm · 480k wafers/yr
Full equipment breakdown ↓
02 · Deep analysis

Equipment-breakdown console

Capex by category · $16B
  • Lithography (EUV/DUV)$5.28B · 33%
  • Etch$2.08B · 13%
  • Deposition$1.92B · 12%
  • Metrology / process control$1.76B · 11%
  • Other process (implant, CMP, clean)$2.08B · 13%
  • Facility & cleanroom$2.88B · 18%
Total fab capex
$16B
$400K/wspm capital intensity
Annual depreciation
$2.29B
over 7 yr
Annual capacity
480k
wafers/yr
Leading-edge capital

Among the most capital-intensive manufacturing on earth — EUV-heavy lithography drives the cost, and only high volume justifies it.

Lithography is 33% of this build ($5.28B) — EUV-driven; the cleanroom another 18%.

Next: feed this capex and the $2.29B annual depreciation into Fab ROI.

Reference

Capital intensity by node

Node$/wspm50k wspm fabLitho shareEUV
28nm$120k$6B22%
16/14nm$180k$9B25%
7nm$300k$15B30%yes
5nm$400k$20B33%yes
3nm$500k$25B35%yes
2nm$650k$32.5B36%yes
Why it matters

The economics of fab capital

Lithography is the biggest line item

At advanced nodes, photolithography — dominated by EUV scanners at $150–400M each — is roughly a third of total fab tool capex, more than any other category. It's why EUV access is a strategic chokepoint.

Capital intensity has risen ~5× since 28nm

Per unit of capacity, a 2nm fab costs several times what a 28nm fab does. Each node adds more process steps, more EUV layers and tighter metrology — the equipment fleet simply grows.

Tools depreciate in 5–8 years

Fab equipment is depreciated far faster than the building, because the node it serves becomes competitively obsolete quickly. That fast depreciation is the bridge from capex to the per-wafer cost a fab must recover.

A cleanroom is ~20% of the bill

The facility and cleanroom — vibration isolation, ultra-pure water and chemicals, air handling — are a large fixed cost before a single tool is installed, which is why brownfield expansions are so much cheaper than greenfield builds.

Field notes

The capital wall of the leading edge

The defining economic fact of modern semiconductors is the size of the entry ticket. Building the capacity to make leading-edge chips costs tens of billions, and that number has climbed faster than almost anything in industrial history — a wall of capital that reshaped who can compete and why governments treat chip manufacturing as national infrastructure.

The right way to compare fabs of different sizes is capital intensity: the capex per unit of capacity, in dollars per wafer-per-month. It strips out fab size and reveals the underlying cost of adding capacity at a node. That figure has risen ~five-fold from 28nm to 2nm — not from waste, but because each node demands more process steps, tighter tolerances, and above all more EUV lithography, the single most expensive category in any advanced fab.

EUV is why the breakdown looks the way it does — at the leading edge, lithography alone is a third or more of the entire tool-and-facility bill, dwarfing etch, deposition and metrology. The cleanroom and facility, perhaps a fifth of the build, are a large fixed cost incurred before any tool arrives, which is exactly why brownfield expansion is so much cheaper than greenfield.

This capital becomes per-wafer cost through depreciation — written down over just five to eight years because the node becomes obsolete quickly. Pair this with the Fab ROI console to turn a capex estimate into a return, and with Wafer Cost to see how that capital flows into a single chip's price.

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Trusted by Fab Construction, Strategy & Investors

4.8
Based on 3,380 reviews

The category breakdown matches our actual capex structure remarkably well, lithography dominance and all. I use it to give executives a fast, credible scale estimate before the detailed quotes come in. The node-by-node capital intensity is a great teaching tool.

K
Klaus Berger
Fab construction program manager
May 11, 2026

Quantifying how lithography's share grows with EUV finally made the 'why is the leading edge so concentrated' argument land with policymakers I advise. Pairs perfectly with the fab ROI console for a complete investment picture.

A
Anjali Rao
Semiconductor supply-chain strategist
March 22, 2026

Good first-order sizing for customer conversations. The capital-intensity-by-node figures are close to what we see, and the brownfield note is a nice touch. Would love per-vendor tool detail, but for scale and structure it's excellent.

T
Tom Eriksson
Equipment vendor account lead
February 14, 2026

I model announced fab capacity into capex with this to sanity-check headline investment numbers. The $/wspm framing makes wildly different fab sizes comparable. Clean, fast, and the reality anchors are genuinely informative.

G
Grace Liu
Infrastructure investment analyst
December 19, 2025

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capex = capacity × capital intensity · breakdown & intensity are industry estimates · Last reviewed: 2026-06